Plasma Source - メーカー・企業と製品の一覧

Intelligent Remote Plasma Source "Paragon®"

NF3 maximum flow rate 8 slm, improved process performance and lifespan with unique PEO plasma block design!

"Paragon (R)" has achieved more suitable data transfer and control for next-generation nano process development and manufacturing, based on the characteristics of the MKS low magnetic field toroidal plasma source with a proven track record in mass production. It supports CVD and ALD/ALE process chamber cleaning, achieving high analytical efficiency (>98%) even under conditions of 8 slm NF gas flow and a maximum pressure of 10 Torr. 【Features】 ■ Maximum NF flow rate of 8 slm, compact design reduces cleaning time ■ Unique plasma block design with PEO coating improves process performance and lifespan ■ RoHS compliant, CE, S2, F47 *For more details, please refer to the PDF document or feel free to contact us.

企業：日本エム・ケー・エス
価格：Other

others

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『R*evolution V』

Intelligent process control for on-wafer processing

"R*evolution V" is a product that integrates proven low magnetic field toroidal plasma technology, advanced communication capabilities, and high-precision power control functions. The remote plasma source in this series is suitable for oxygen radical-based applications such as photoresist stripping and various surface treatments. Additionally, the EtherCAT communication protocol enables near real-time information provision of critical plasma source operating parameters to process tools and factory networks. This product can circulate information to process tools and factory databases to support monitoring and modification of process parameters and operational diagnostics (APC/FDC) applications, ensuring high operational rates of process tools. [Features] - Function-integrated unit that can be directly installed in the chamber - Quartz applicator for high-density oxygen-based plasma - Output up to 6kW - High output reproducibility - High precision output control <1% *For more details, please refer to the PDF document or feel free to contact us.

企業：日本エム・ケー・エス
価格：Other

Other measurement, recording and measuring instruments

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Plasma Source "PLUME Series"

Introducing a plasma source compatible with multi-purpose applications: ICP, neutral atoms, and ion sources!

We would like to introduce the 'PLUME Series' that we handle. It is suitable for powder and inline treatment, remote plasma source / immersed plasma source. Please feel free to consult us when you need assistance. 【Features】 ■ ICP, neutral atom, and ion sources that can accommodate multiple purposes ■ For powder and inline treatment ■ Remote plasma source / immersed plasma source * For more details, please refer to the PDF document or feel free to contact us.

企業：ハイテック・システムズ
価格：Other

others

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Microwave Plasma Source "MIRENIQUE Series"

Ideal for R&D equipment using MWPECVD! MW-SURFATRONS are compatible with atmospheric pressure or reduced pressure.

The "MIRENIQUE series" is a microwave plasma source. It is suitable for PECVD, diamond, DLC, CNT, and plasma-assisted polymerization, with reactors and plasma sources ideal for MWPECVD R&D equipment. MW-SURFATRONS can operate at atmospheric pressure or reduced pressure. 【Features】 ■ Suitable for PECVD, diamond, DLC, CNT, and plasma-assisted polymerization ■ Reactors and plasma sources suitable for MWPECVD R&D equipment ■ MW-SURFATRONS can operate at atmospheric pressure or reduced pressure *For more details, please refer to the PDF materials or feel free to contact us.

企業：ハイテック・システムズ
価格：Other

Plasma surface treatment equipment

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Plasma Source - メーカー・企業と製品の一覧

Plasma Sourceの製品一覧

Intelligent Remote Plasma Source "Paragon®"

『R*evolution V』

Plasma Source "PLUME Series"

Microwave Plasma Source "MIRENIQUE Series"